Effects of optical activity to Mueller matrix ellipsometry of composed waveplates

Mueller matrix ellipsometry has been used to precisely characterize quartz waveplates for demanding applications in the semiconductor industry and high precision polarimetry. We have found this experimental technique be beneficial use because it enables us obtain absolute precise measurement of retardation a wide spectral range, waveplate orientation, compound adjustment. In paper, necessity including optical activity model data treatment is demonstrated. Particularly, influences adjustment misalignment between perpendicularly oriented biplate. demonstrate that omitting from leads inaccurate values misalignment. addition, depolarization effects caused by finite monochromator bandwidth included model. Incorporation required development rigorous theory based on appropriate constitutive equations. The generalized Yeh’s algebra bianisotropic media calculation eigenmodes propagation chiral materials with reduced symmetry. Based applied method, authors proposed approximated analytical form representing optically active biplate provided discussion numerical limits method.